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Daimei Instrument Technology Service (Shanghai) Co., Ltd
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Daimei Instrument Technology Service (Shanghai) Co., Ltd

  • Thông tin E-mail

    marketing@dymek.com

  • Điện thoại

    13917837832

  • Địa chỉ

    Room 306-308, Building 6, No. 35, Lane 2216, Jingao Road, Pudong, Shanghai

Liên hệ bây giờ

Plasma enhanced chemical vapor deposition (PECVD) system

Có thể đàm phánCập nhật vào12/23
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Tổng quan

Vision 310 Plasma Enhanced Chemical Vapor Deposition (PECVD) System - Continuation of PTI 790+Series, Continuing Successful Experience in Serving Diversified Markets

Chi tiết sản phẩm

1. Flexible sedimentation ability

·等离子体增强化学气相沉积(PECVD)系统Silicon based deposition processes - oxides, nitrides, oxynitrides, amorphous silicon(a-Si)、Silicon carbide(SiC

·等离子体增强化学气相沉积(PECVD)系统Research and Development

·等离子体增强化学气相沉积(PECVD)系统prototyping

·等离子体增强化学气相沉积(PECVD)系统Small batch production-Photonics, solid-state lightingTheMEMSAnd nanotechnology

·等离子体增强化学气相沉积(PECVD)系统Application areas: interlayer insulation layer, passivation layer, encapsulation layer, mask layer, anti reflection layer


2. Performance value

等离子体增强化学气相沉积(PECVD)系统1. Large manual loading platform(406mm)

2. Excellent cleanliness

3. High uniformity

4. High throughput等离子体增强化学气相沉积(PECVD)系统

5. Reliable software

6. Compact footprint

7. Cost effective

8.easy to maintain

9.Adopting industry-leading components


3. Verified solutions

·Extensive 'turnkey' craftsmanship

·High film uniformity achieved through optimized spray heads

·High standard utilization and reliability - using Tier I OEM components, rapid vacuuming, and optional in-situ endpoint detection to avoid excessive cleaning

·Enjoy recognized services and support

·Stress control achieved through low-frequency or helium dilution


等离子体增强化学气相沉积(PECVD)系统



等离子体增强化学气相沉积(PECVD)系统




等离子体增强化学气相沉积(PECVD)系统



等离子体增强化学气相沉积(PECVD)系统



等离子体增强化学气相沉积(PECVD)系统




等离子体增强化学气相沉积(PECVD)系统